cleanroom-metrology-controller

Cleanroom Metrology Controller

Purpose

The Cleanroom Metrology Controller skill provides comprehensive in-line metrology for nanofabrication process control, enabling precise measurement and monitoring of critical dimensions, film thicknesses, and pattern quality.

Capabilities

• CD-SEM measurement recipes
• Spectroscopic ellipsometry analysis
• Film thickness mapping
• Surface profilometry
• Defect inspection
• Overlay measurement

Usage Guidelines

Metrology Control

1. CD-SEM Measurements
2. Develop automated recipes
3. Calibrate against reference
4. Track process variation

1. Ellipsometry
2. Select appropriate model
3. Map thickness uniformity
4. Characterize optical constants

1. Defect Inspection
2. Set detection thresholds
3. Classify defect types
4. Track yield trends

Process Integration

• All fabrication processes
• Analysis Pipeline Validation

Input Schema

{
  "measurement_type": "cd_sem|ellipsometry|profilometry|defect",
  "target_parameter": "string",
  "wafer_map": {"sites": "number", "pattern": "string"},
  "specification": {
    "target": "number",
    "tolerance": "number"
  }
}

Output Schema

{
  "measurements": [{
    "site": "string",
    "value": "number",
    "unit": "string"
  }],
  "statistics": {
    "mean": "number",
    "std_dev": "number",
    "range": "number"
  },
  "uniformity": "number (%)",
  "pass_fail": "boolean",
  "trending_data": {"dates": [], "values": []}
}